Monte Carlo Feature
Profile Model (MCFPM)
Robert J. Hoekstra and
Mark J. Kushner
The Monte Carlo Feature Profile Model (MCFPM) is an offline module used by the Hybrid Plasma Equipment Model (HPEM). The resulting flux distributions produced by the Plasma Chemistry Monte Carlo Model (PCMCM) are utilized to determine the evolution of etch features in plasma etching reactors. The MCFPM takes the following inputs to generate etch profiles.
- Initial material mesh indicating the initial feature shape and material.
- Species and chemistry file: This file allows the etch mechanisms to be defined in a chemical reaction format. Energy as well as angular dependence can be included for any and all reactions.
- Gas species flux distribution used to determine the launching direction and energy of incoming particles.
There are both 2D and 3D versions of the code. Below is an example of 3D etched feature in polysilicon.
The 2D version of the MCFPM allows for speculare reflection of high energy ions at the sidewalls of the etch profile. The effect can be seen in the microtrench formation in the corners of the feature below.
HPEM | PCMCM